By Michael Nastasi,James W. Mayer

ISBN-10: 3540236740

ISBN-13: 9783540236740

ISBN-10: 3642062598

ISBN-13: 9783642062599

Ion implantation is among the key processing steps in silicon built-in circuit expertise. a few built-in circuits require as much as 17 implantation steps and circuits are seldom processed with under 10 implantation steps. managed doping at managed depths is a necessary function of implantation. Ion beam processing is additionally used to enhance corrosion resistance, to harden surfaces, to lessen put on and, quite often, to enhance fabrics houses. This e-book offers the physics and fabrics technological know-how of ion implantation and ion beam amendment of fabrics. It covers ion-solid interactions used to foretell ion levels, ion straggling and lattice disease. additionally taken care of are shallow-junction formation and cutting silicon with hydrogen ion beams. issues very important for fabrics amendment, corresponding to ion-beam blending, stresses, and sputtering, also are described.

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Ion Implantation and Synthesis of Materials (Springer Series in Materials Science) by Michael Nastasi,James W. Mayer


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