By Francis F. Chen,Jane P. Chang
ISBN-10: 0306474972
ISBN-13: 9780306474972
Plasma processing of semiconductors is an interdisciplinary box requiring wisdom of either plasma physics and chemical engineering. the 2 authors are specialists in each one of those fields, and their collaboration leads to the merging of those fields with a typical terminology. uncomplicated plasma innovations are brought painlessly to people who have studied undergraduate electromagnetics yet have had no earlier publicity to plasmas. Unnecessarily precise derivations are passed over; but the reader is ended in comprehend in a few intensity these techniques, akin to the constitution of sheaths, which are very important within the layout and operation of plasma processing reactors. Physicists no longer acquainted with low-temperature plasmas are brought to chemical kinetics, floor technology, and molecular spectroscopy. the fabric has been condensed to fit a nine-week graduate direction, however it is enough to convey the reader brand new on present difficulties reminiscent of copper interconnects, low-k and high-k dielectrics, and oxide harm. scholars will have fun with the web-style format with abundant colour illustrations contrary the textual content, with plentiful room for notes.
This brief e-book is perfect for brand new employees within the semiconductor who are looking to be cited to hurry with minimal attempt. it's also appropriate for Chemical Engineering scholars learning plasma processing of fabrics; Engineers, physicists, and technicians getting into the semiconductor who desire a speedy evaluation of using plasmas within the undefined.
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Lecture Notes on Principles of Plasma Processing by Francis F. Chen,Jane P. Chang
by Kenneth
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