By Fumio Shimura

ISBN-10: 0127521429

ISBN-13: 9780127521428

This quantity reports the newest realizing of the habit and roles of oxygen in silicon, on the way to hold the sector into the ULSI period from the experimental and theoretical issues of view. The fourteen chapters, written through famous specialists representing commercial and educational associations, conceal completely the oxygen comparable phenomena from the crystal development to gadget fabrication tactics, in addition to imperative diagnostic ideas for oxygen.

  • Comprehensive learn of the habit of oxygen in silicon
  • Discusses silicon crystals for VLSI and ULSI applications
  • Thorough assurance from crystal development to machine fabrication
  • Edited by way of technical specialists within the field
  • Written by means of famous specialists from commercial and educational institutions
  • Useful to graduate scholars, scientists in different disciplines, and lively individuals within the area of silicon-based microelectronics research
  • 297 unique line drawings

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Oxygen in Silicon: 42 (Semiconductors and Semimetals) by Fumio Shimura


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